The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2020
Filed:
Sep. 29, 2017
Fanuc Corporation, Yamanashi, JP;
Shouta Takizawa, Yamanashi, JP;
Junichirou Yoshida, Yamanashi, JP;
Fumikazu Warashina, Yamanashi, JP;
FANUC CORPORATION, Yamanashi, JP;
Abstract
A projection pattern creation apparatus is configured to capture an image of a projection pattern projected from a pattern projection device by an imaging device to measure a three-dimensional position and/or a shape of an object. The projection pattern creation apparatus includes: a projection pattern deformation unit configured to reproduce deformation when a projected projection pattern is included in an image captured by the imaging device on the basis of characteristics of optical systems of the pattern projection device and the imaging device, and/or a positional relation between the pattern projection device and the imaging device and generate a deformation projection pattern; and a first projection pattern improvement unit configured to generate a second projection pattern obtained by improving a first projection pattern, on a basis of a first deformation projection pattern generated when the first projection pattern is projected toward evaluation surfaces having different positions and inclinations.