The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2020

Filed:

May. 31, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Jing Sha, White Plains, NY (US);

Michael A. Guillorn, Cold Springs, NY (US);

Derren N. Dunn, Sandy Hook, CT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06N 3/04 (2006.01); G06N 5/04 (2006.01); G06N 3/08 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G06N 3/04 (2013.01); G06N 3/088 (2013.01); G06N 5/046 (2013.01);
Abstract

A computer-implemented method, computer program product, and computer processing system are provided for generating synthetic layout patterns. The method includes receiving, by a processor, a set of physical design layouts that include a variety of layout patterns for neural network training. The method further includes generating, by the processor, a set of training layout pattern images for the neural network training by performing automatic image capturing on the set of physical design layouts with scripts. The method also includes training, by the processor, a feedforward neural network (FFNN)-based Variational Autoencoder (VAE) with the set of training layout pattern images. The method additionally includes generating, by the processor using the FFNN-based VAE, new synthetic layout images.


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