The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2020

Filed:

Sep. 24, 2018
Applicant:

Nikon Corporation, Tokyo, JP;

Inventors:

Masaki Kato, Yokohama, JP;

Tohru Kiuchi, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/16 (2006.01); G03F 7/24 (2006.01); G03F 9/00 (2006.01); G03F 7/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70366 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/24 (2013.01); G03F 7/70 (2013.01); G03F 7/70641 (2013.01); G03F 7/70758 (2013.01); G03F 7/70775 (2013.01); G03F 7/70791 (2013.01); G03F 9/00 (2013.01); G03F 7/42 (2013.01);
Abstract

A pattern exposure apparatus comprising: a rotary drum that supports a flexible substrate, which is exposed with a mask pattern formed on an outer circumferential surface of a cylindrical mask that rotates about a first center axis; a rotary drum-side scale portion that is arranged for measuring a movement of the substrate which is fed in a circumferential direction by a rotation of the rotary drum, that includes a scale; a first projection optical system that projects an exposure light; a second projection optical system that projects an exposure light; a first reading device that is arranged to oppose with the rotary drum-side scale portion and that reads the scale; and a second reading device that is arranged to oppose with the rotary drum-side scale portion and that reads the scale.


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