The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2020

Filed:

May. 08, 2019
Applicant:

Hamamatsu Photonics K.k., Hamamatsu-shi, Shizuoka, JP;

Inventors:

Tomonori Nakamura, Hamamatsu, JP;

Nobuyuki Hirai, Hamamatsu, JP;

Assignee:

HAMAMATSU PHOTONICS K.K., Hamamatsu-shi, Shizuoka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 25/72 (2006.01); G01N 17/00 (2006.01); G01J 5/00 (2006.01); G01R 31/265 (2006.01); G01R 31/02 (2006.01); G01R 31/311 (2006.01);
U.S. Cl.
CPC ...
G01N 25/72 (2013.01); G01R 31/025 (2013.01); G01R 31/2656 (2013.01); G01R 31/311 (2013.01);
Abstract

A heat source position inside a measurement object is identified with high accuracy by improving time resolution. An analysis system according to the present invention is an analysis system that identifies a heat source position inside a measurement object, and includes a condition setting unit that sets a measurement point for one surface of the measurement object, a tester that applies a stimulation signal to the measurement object, a light source that irradiates the measurement point of the measurement object with light, a photo detector that detects light reflected from a predetermined measurement point on the surface of the measurement object according to the irradiation of light and outputs a detection signal, and an analysis unit that derives a distance from the measurement point to the heat source position based on the detection signal and the stimulation signal and identifies the heat source position.


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Nakamura, Tomonori. (2020). Analysis system and analysis method (U.S. Patent No. 10591427). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10591427

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