The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2020

Filed:

Aug. 09, 2017
Applicant:

Ford Global Technologies, Llc, Dearborn, MI (US);

Inventors:

Bradley Arnold Lammers, Canton, MI (US);

Ahthavan Raja Sureshkumar, LaSalle, CA;

Tyler James-Ray Kaldobsky, Westland, MI (US);

Robert Joseph Bartz, Detroit, MI (US);

Douglas G Hughes, South Lyon, MI (US);

Assignee:

Ford Global Technologies, LLC, Dearborn, MI (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F16K 41/10 (2006.01); F16K 15/20 (2006.01); F16K 31/06 (2006.01); F16K 15/14 (2006.01); B60K 1/04 (2019.01); H01M 2/36 (2006.01); B60L 53/20 (2019.01);
U.S. Cl.
CPC ...
F16K 41/103 (2013.01); F16K 15/148 (2013.01); F16K 15/202 (2013.01); F16K 31/0672 (2013.01); B60K 1/04 (2013.01); B60L 53/20 (2019.02); H01M 2/362 (2013.01);
Abstract

A one-way valve is provided. The one-way valve includes a base having a first ring wall including a first aperture disposed therethrough. The base further includes a second ring wall coaxial with the first ring wall. The second ring wall includes a second aperture disposed therethrough and angularly offset from the first aperture. The base further includes a central arching surface. The one-way valve includes a diaphragm disposed on the central arching surface. The one-way valve further includes a cover secured to the base and defining an annular skirt region. The one-way valve further includes a seal disposed in the annular skirt region.


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