The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2020
Filed:
Jun. 30, 2016
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Yann A. M. Mignot, Slingerlands, NY (US);
Chih-Chao Yang, Glenmont, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/02 (2006.01); H01L 23/522 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76814 (2013.01); H01L 21/02063 (2013.01); H01L 21/76811 (2013.01); H01L 21/76816 (2013.01); H01L 21/76831 (2013.01); H01L 23/5226 (2013.01); H01L 23/53295 (2013.01);
Abstract
A method includes forming at least a first via in a multilayer structure comprising a first layer and a second layer formed over the first layer, the first via extending from a top of the second layer to a top of a first contact formed in the first layer and forming a polymer film on at least a portion of sidewalls of the first via by etching the top of the first contact using a cleaning process.
Mignot, Yann A. M.. (2020). Via cleaning to reduce resistance (U.S. Patent No. 10586732). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10586732
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile