The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2020
Filed:
Dec. 28, 2015
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Takashi Ota, Kyoto, JP;
Taiki Hinode, Kyoto, JP;
Assignee:
SCREEN Holdings Co., Ltd., , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0206 (2013.01); H01L 21/02063 (2013.01); H01L 21/02071 (2013.01); H01L 21/02321 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/67103 (2013.01); H01L 21/0217 (2013.01); H01L 21/02274 (2013.01); H01L 21/67167 (2013.01);
Abstract
Method for performing cleaning treatment on a substrate having a fine pattern provided with a film formed on the surface, comprises: a silylating step of supplying a silylating agent to the surface of the substrate and silylating the surface of the substrate; and a liquid-chemical cleaning step of supplying a cleaning liquid chemical to the surface of the substrate and cleaning the surface of the substrate after, or simultaneously with, the silylating step.