The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2020

Filed:

Dec. 29, 2016
Applicant:

Tokai Carbon Korea Co., Ltd, Gyeonggi-do, KR;

Inventors:

Ki Won Kim, Gyeonggi-do, KR;

Hyeong Uk Roh, Gyeonggi-do, KR;

Jong Sung Yun, Gyeonggi-do, KR;

Won Pyo Hong, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/02 (2006.01); C23C 16/56 (2006.01); C23C 16/04 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); C23C 16/0227 (2013.01); C23C 16/0254 (2013.01); C23C 16/042 (2013.01); C23C 16/4401 (2013.01); C23C 16/56 (2013.01); H01J 37/32009 (2013.01); H01J 37/3255 (2013.01); H01J 37/32532 (2013.01); H01J 2237/334 (2013.01);
Abstract

A method and apparatus for reproducing a component of a semiconductor manufacturing apparatus, and a reproduced component are provided. The method may include a preparing step of preparing a damaged component of a semiconductor manufacturing apparatus, a first cleaning step of cleaning the damaged component, a masking step of masking at least one of areas including an undamaged part of the damaged component, a reproduced part forming step of forming a reproduced part on the damaged component using a chemical vapor deposition (CVD), a post-grinding step of grinding the damaged component with the reproduced part, and a second cleaning step of cleaning the damaged component with the reproduced part.


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