The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2020
Filed:
Dec. 05, 2014
Agc Glass Europe, S.a., Gosselies, BE;
Agc Flat Glass North America, Inc., Alpharetta, GA (US);
Asahi Glass Co., Ltd., Tokyo, JP;
Thomas Biquet, Gosselies, BE;
Peter Maschwitz, Sebastopol, CA (US);
John Chambers, San Francisco, CA (US);
Hughes Wiame, Gosselies, BE;
AGC GLASS EUROPE, Louvain-la Neuve, BE;
AGC FLAT GLASS NORTH AMERICA, INC., Alpharetta, GA (US);
ASAHI GLASS CO., LTD., Tokyo, JP;
Abstract
The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (), each electrode comprising an elongated cavity (), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (), and outlet nozzle width ().