The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2020

Filed:

Mar. 08, 2017
Applicants:

Pantechnik, Bayeux, FR;

A.d.a.m. SA, Meyrin, CH;

Inventors:

Pierre Salou, Monceaux en Bessin, FR;

Daniel Fink, Geneva, CH;

Assignees:

PANTECHNIK, Bayeux, FR;

A.D.A.M. SA, Meyrin, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); H05H 7/04 (2006.01); H05H 7/08 (2006.01); G21K 1/087 (2006.01); G21K 1/093 (2006.01); H01J 37/04 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/147 (2013.01); G21K 1/087 (2013.01); G21K 1/093 (2013.01); G21K 5/04 (2013.01); H01J 37/04 (2013.01); H05H 7/04 (2013.01); H05H 7/08 (2013.01); H01J 2237/31701 (2013.01); H05H 2007/046 (2013.01); H05H 2007/085 (2013.01); H05H 2007/087 (2013.01);
Abstract

A device for modulating the intensity of a charged particle beam emitted along an axis, comprises 4×N consecutive deflection systems, with N=1 or 2, with the deflection systems being positioned along the axis of said particle beam, and being capable of deflecting the beam relative to the axis in the same direction, with alternating directions of deflection, for two consecutive systems, means for applying a force for deflecting the beam for each deflection system and for varying the applied force; two collimators each having a slot with an opening that increases in width from the center towards the periphery, located respectively between the first and second deflection systems and between the third and fourth deflection systems, with the opening of the slot of the first collimator facing towards one side of the emission axis of the beam, with the opening of the slot of the second collimator facing towards the opposite side of the emission axis of the beam.


Find Patent Forward Citations

Salou, Pierre. (2020). Device for modulating the intensity of a particle beam from a charged particle source (U.S. Patent No. 10586675). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10586675

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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