The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2020

Filed:

Mar. 14, 2017
Applicant:

Eastman Kodak Company, Rochester, NY (US);

Inventors:

Todd Mathew Spath, Hilton, NY (US);

Carolyn Rae Ellinger, Rochester, NY (US);

Assignee:

EASTMAN KODAK COMPANY, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/4412 (2013.01); C23C 16/45517 (2013.01); C23C 16/45544 (2013.01); C23C 16/45551 (2013.01); C23C 16/45568 (2013.01); C23C 16/45574 (2013.01);
Abstract

A thin film deposition system includes a vacuum-preloaded gas bearing deposition head positioned in an external environment. The deposition head has a vertically-oriented output face including a plurality of source openings through which gaseous materials are supplied and one or more exhaust openings. An exhaust pressure at the exhaust openings is less than an ambient pressure, and a source pressure at the source openings is greater than the exhaust pressure, with the pressure at the outermost source openings being greater than the ambient pressure. A substrate positioner applies a vertical force onto a substrate unit, the vertical force passing through a center of gravity of the substrate unit. A motion control system moves the substrate positioner, thereby moving the substrate unit relative to the output face in an in-track direction without constraining the motion of the substrate unit in a direction normal to the output face of the deposition head.


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