The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2020
Filed:
Jan. 12, 2017
Commissariat À L'énergie Atomique ET Aux Énergies Alternatives, Paris, FR;
Christophe Martinez, Grenoble, FR;
Bernard Aventurier, Saint Joseph de Riviere, FR;
Abstract
A method of manufacturing a primary mold for the forming of a retroreflective screen, the method including the steps of: a) forming, on the front surface of such a substrate, a layer of a material such that the first substrate is selectively etchable over said layer; and b) forming microrecesses from the rear surface of the first substrate by selective etching of the first substrate over said layer, each microrecess emerging on the rear surface of said layer and having a back parallel to the front surface of the first substrate and first and second lateral walls orthogonal to each other and orthogonal to the back the first and second lateral walls and the back of the microrecess joining at a same point and forming a trihedron.