The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2020

Filed:

Dec. 04, 2017
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Xiaoju Wu, Dallas, TX (US);

Robert James Todd, Plano, TX (US);

Henry Litzmann Edwards, Garland, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 21/74 (2006.01); H01L 21/762 (2006.01); H01L 21/265 (2006.01); H01L 21/324 (2006.01); H01L 21/225 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7816 (2013.01); H01L 21/2253 (2013.01); H01L 21/26513 (2013.01); H01L 21/28518 (2013.01); H01L 21/324 (2013.01); H01L 21/74 (2013.01); H01L 21/76202 (2013.01); H01L 21/76224 (2013.01); H01L 29/0653 (2013.01); H01L 29/1083 (2013.01); H01L 29/1095 (2013.01); H01L 29/408 (2013.01); H01L 29/66492 (2013.01); H01L 29/66681 (2013.01); H01L 29/7835 (2013.01);
Abstract

A semiconductor device includes a NMOS transistor with a back gate connection and a source region disposed on opposite sides of the back gate connection. The source region and back gate connection are laterally isolated by an STI oxide layer which surrounds the back gate connection. The NMOS transistor has a gate having a closed loop configuration, extending partway over a LOCOS oxide layer which surrounds, and is laterally separated from, the STI oxide layer. A lightly-doped drain layer is disposed on opposite sides of the NMOS transistor, extending under the LOCOS oxide layer to a body region of the NMOS transistor. The LOCOS oxide layer is thinner than the STI oxide layer, so that the portion of the gate over the LOCOS oxide layer provides a field plate functionality. The NMOS transistor may optionally be surrounded by an isolation structure which extends under the NMOS transistor.


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