The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2020

Filed:

Apr. 05, 2017
Applicant:

Hrl Laboratories, Llc, Malibu, CA (US);

Inventors:

Heiko Hoffmann, Simi Valley, CA (US);

David W. Payton, Calabasas, CA (US);

Assignee:

HRL Laboratories, LLC, Malibu, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/11 (2017.01); G06T 7/194 (2017.01);
U.S. Cl.
CPC ...
G06T 7/194 (2017.01); G06T 7/11 (2017.01);
Abstract

Described is a system for self-organized critical image segmentation. During operation, the system generates a delta pattern from a self-organized critical process. An initial test pattern is then altered based on the delta pattern to generate a new test pattern. The new test pattern is a mask identifying distinct regions in an image. A new energy score is then generated of the new test pattern. The operations of generating the delta pattern and altering the initial test pattern are then repeated until an energy score of the new test pattern is less than an energy score of the initial test pattern. At that point, the initial test pattern is replaced with the new test pattern. Finally, the process is repeated until a termination condition is reached, at which point the new test pattern provides the image segmentation by dividing the image into distinct regions, including a foreground and background.


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