The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Dec. 28, 2016
Applicant:
Dexerials Corporation, Shinagawa-ku, Tokyo, JP;
Inventor:
Asahiko Nogami, Sendai, JP;
Assignee:
Dexerials Corporation, Shinagawa-ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01); H01S 3/106 (2006.01); H01S 3/13 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2053 (2013.01); G03F 7/0002 (2013.01); G03F 7/70025 (2013.01); H01L 21/027 (2013.01); H01S 3/106 (2013.01); H01S 3/1305 (2013.01);
Abstract
An exposure apparatusis an exposure apparatus for forming a pattern by exposure by irradiating a set masterwith laser light, comprising: an optical pickupwhich is capable of adjusting the focus of laser light and a control unitwhich adjusts the focus of laser light emitted from the optical pickupusing integrated surface profile data indicating the relative positional relationship between the surface of the masterand the optical pickupaccording to at least one of the surface roughness of the masterthe inclination of the masterand the decentering of the master