The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2020

Filed:

Feb. 05, 2019
Applicant:

Luxtera, Inc., Carlsbad, CA (US);

Inventors:

Ali Ayazi, Carlsbad, CA (US);

Gianlorenzo Masini, Carlsbad, CA (US);

Subal Sahni, La Jolla, CA (US);

Attila Mekis, Carlsbad, CA (US);

Thierry Pinguet, Arlington, WA (US);

Assignee:

Luxtera, Inc., Carlsbad, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/025 (2006.01); G02F 1/225 (2006.01); G02F 1/21 (2006.01);
U.S. Cl.
CPC ...
G02F 1/025 (2013.01); G02F 1/2257 (2013.01); G02F 2001/212 (2013.01); G02F 2201/06 (2013.01); G02F 2202/105 (2013.01);
Abstract

Methods and systems for a low-parasitic silicon high-speed phase modulator are disclosed and may include in an optical phase modulator that comprises a PN junction waveguide formed in a silicon layer, wherein the silicon layer may be on an oxide layer and the oxide layer may be on a silicon substrate. The PN junction waveguide may have fingers of p-doped and n-doped regions on opposite sides along a length of the PN junction waveguide. Contacts may be formed on the fingers of p-doped and n-doped regions. The fingers of p-doped and n-doped regions may be arranged symmetrically about the PN junction waveguide or staggered along the length of the PN junction waveguide. Etch transition features may be removed along the p-doped and n-doped regions.


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