The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Dec. 18, 2015
Satake Corporation, Chiyoda-ku, Tokyo, JP;
Hiroki Ishizuki, Tokyo, JP;
Akira Eto, Tokyo, JP;
Takahiro Doi, Tokyo, JP;
Hiroaki Takeuchi, Tokyo, JP;
SATAKE CORPORATION, Tokyo, JP;
Abstract
An object of the present invention is to improve the quality level discrimination accuracy of the grain G by a grain quality level discrimination device. The device includes an optical unitthat emits light to the grain G, receives reflected and/or transmitted light from the grain G by a photosensor, and obtains information for discrimination of the quality level of the grain G from the upper and lower surface side of the grain G, and a quality level discrimination unitthat discriminates the quality level of the grain G on the basis of the information. The information on the upper and lower surface sides can be acquired by one optical unit at the same time so that the divergence therebetween due to the displacement or variation of the attitude of the grain G can be avoided. The reference plate for the correction of the information is placed outside of the moving path of the grain G to prevent it from soiling or damaging. Thus the deterioration of information can be avoided. Further, a reference plate especially for the information to be obtained from the side surface of the grain G may be provided for enhancing the accuracy of the side surface information. Thus the quality level discrimination accuracy can be improved further.