The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2020

Filed:

Jun. 14, 2018
Applicant:

Koito Manufacturing Co., Ltd., Tokyo, JP;

Inventor:

Akinori Matsumoto, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B60Q 1/04 (2006.01); F21S 41/29 (2018.01); F21V 13/04 (2006.01); F21V 7/09 (2006.01); F21S 41/33 (2018.01); F21S 41/176 (2018.01); F21S 41/16 (2018.01); F21S 41/255 (2018.01); F21S 45/70 (2018.01); F21W 102/13 (2018.01);
U.S. Cl.
CPC ...
B60Q 1/04 (2013.01); F21S 41/16 (2018.01); F21S 41/176 (2018.01); F21S 41/255 (2018.01); F21S 41/295 (2018.01); F21S 41/33 (2018.01); F21S 41/333 (2018.01); F21S 45/70 (2018.01); F21V 7/09 (2013.01); F21V 13/04 (2013.01); F21W 2102/13 (2018.01);
Abstract

A reflector is configured such that an opening is formed in a portion located on an extension line of the optical path of laser light from a laser light emitting element to a light emitter. In addition, a reflective surface of the reflector includes a first reflective area located at the front side of the opening and a second reflective area located at the rear side of the opening, and the first reflective area is displaced to the light emitter side with respect to the second reflective area. Thereby, compared with a case where a first reflective area is formed in a curved shape obtained by extending the second reflective area as in the related art, a large solid angle based on the light emission center of the light emitter is secured, and a luminous flux utilization ratio with respect to the light emitted from the light emitter is increased.


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