Method of producing semiconductor device for reducing variations of device characteristics within a surface of a semiconductor wafer

Abstract

A method of producing a semiconductor device including steps (A) and (B). Step (A) is preparing a semiconductor epitaxial wafer including a plurality of device regions, each including a body region contacting a semiconductor layer. Step (B) is forming a channel layer contacting at least a part of the body region by epitaxial growth of a semiconductor on a surface of the semiconductor layer. The channel layer contains an impurity at a concentration ranging from 1×10cmto 1×10cm, inclusive, and has a thickness ranging from 10 nm to 100 nm, inclusive. In the step (B), a condition for the epitaxial growth is controlled so that, in a plane parallel to the main surface of the semiconductor wafer, a thickness distribution in the channel layer and a concentration distribution of the impurity in the channel layer are negatively correlated to each other.