The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Jun. 28, 2016
Applicant:

Mitsubishi Electric Corporation, Chiyoda-ku, Tokyo, JP;

Inventors:

Hiroaki Tatsumi, Tokyo, JP;

Sho Kumada, Tokyo, JP;

Osamu Suzuki, Tokyo, JP;

Daisuke Kawabata, Tokyo, JP;

Assignee:

MITSUBISHI ELECTRIC CORPORATION, Chiyoda-Ku, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/50 (2006.01); H01L 23/00 (2006.01); H01L 23/488 (2006.01); H01L 23/373 (2006.01); H01L 23/12 (2006.01); H01L 23/498 (2006.01); H01L 25/07 (2006.01); H01L 29/16 (2006.01); H01L 29/20 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01); H01L 29/861 (2006.01);
U.S. Cl.
CPC ...
H01L 24/32 (2013.01); H01L 21/50 (2013.01); H01L 23/12 (2013.01); H01L 23/3735 (2013.01); H01L 23/488 (2013.01); H01L 23/49866 (2013.01); H01L 24/83 (2013.01); H01L 25/072 (2013.01); H01L 29/1602 (2013.01); H01L 29/1608 (2013.01); H01L 29/20 (2013.01); H01L 29/2003 (2013.01); H01L 29/7393 (2013.01); H01L 29/78 (2013.01); H01L 29/861 (2013.01); H01L 2224/29139 (2013.01); H01L 2224/3207 (2013.01); H01L 2224/83385 (2013.01);
Abstract

A semiconductor device includes an electrode having a flat part and a non-flat part made up of a concave part, a joint layer being made of a sintered body of metal crystal grains provided on the flat part and the non-flat part of the electrode, and a semiconductor element being joined to the electrode with the joint layer therebetween, wherein the joint layer has a first region sandwiched between the non-flat part and the semiconductor element and a second region sandwiched between the flat part and the semiconductor element, and either one of the first region and the second region having a larger film thickness has a filling rate of the metal crystal grains smaller than the other one of the first region and the second region having a smaller film thickness. The present invention enhances reliability of a joint layer made of a sintered body of metal crystal grains.


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