The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2020
Filed:
Nov. 08, 2016
Adobe Inc., San Jose, CA (US);
Kalyan Krishna Sunkavalli, San Jose, CA (US);
Nathan Aaron Carr, San Jose, CA (US);
Michal Lukac, Prague, CZ;
Elya Shechtman, Seattle, WA (US);
Adobe Inc., San Jose, CA (US);
Abstract
Image modification using detected symmetry is described. In example implementations, an image modification module detects multiple local symmetries in an original image by discovering repeated correspondences that are each related by a transformation. The transformation can include a translation, a rotation, a reflection, a scaling, or a combination thereof. Each repeated correspondence includes three patches that are similar to one another and are respectively defined by three pixels of the original image. The image modification module generates a global symmetry of the original image by analyzing an applicability to the multiple local symmetries of multiple candidate homographies contributed by the multiple local symmetries. The image modification module associates individual pixels of the original image with a global symmetry indicator to produce a global symmetry association map. The image modification module produces a manipulated image by manipulating the original image under global symmetry constraints imposed by the global symmetry association map.