The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2020
Filed:
Sep. 23, 2016
Applicant:
University of Utah Research Foundation, Salt Lake City, UT (US);
Inventors:
Rajesh Menon, Salt Lake City, UT (US);
Peng Wang, Salt Lake City, UT (US);
Assignee:
University of Utah Research Foundation, Salt Lake City, UT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/32 (2006.01); G03H 1/00 (2006.01); G03H 1/08 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03H 1/0808 (2013.01); G02B 5/32 (2013.01); G03H 1/0005 (2013.01); G03H 1/08 (2013.01); H01L 21/30604 (2013.01); H01L 21/67011 (2013.01); G03H 2001/0094 (2013.01); G03H 2001/0816 (2013.01); G03H 2210/30 (2013.01);
Abstract
A system for surface patterning using a three dimensional holographic mask includes a light source configured to emit a light beam toward the holographic mask. The holographic mask can be formed as a topographical pattern on a transparent mask substrate. A semiconductor substrate can be positioned on an opposite site of the holographic mask as the light source and can be spaced apart from the holographic mask. The system can also include a base for supporting the semiconductor substrate.