The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Jun. 23, 2016
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Yuki Suzuki, Osaka, JP;

Yuichi Mukai, Osaka, JP;

Koji Ichikawa, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/30 (2013.01); G03F 7/2041 (2013.01);
Abstract

A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein Rand R2 independently represent a hydrogen atom, a halogen atom or a Calkyl group that may have a halogen atom, Rrepresents a carboxy group, a cyano group or a Caliphatic hydrocarbon group, Arepresents a single bond, *-A-O—, *-A-CO—O—, etc., Aand Aindependently represents a Calkanediyl group, and w1 represents an integer of 0 to 8, Lrepresents a single bond or *-L-CO—O-(L-CO—O)—, Land Lindependently represent a Cdivalent hydrocarbon group, g represent 0 or 1, Rrepresents a Cliner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.


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