The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2020
Filed:
Sep. 28, 2018
Applicant:
View, Inc., Milpitas, CA (US);
Inventors:
Yashraj Bhatnagar, Santa Clara, CA (US);
Robert T. Rozbicki, Los Gatos, CA (US);
Rao Mulpuri, Saratoga, CA (US);
Assignee:
View, Inc., Milpitas, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1523 (2019.01); G02F 1/153 (2006.01); G02F 1/155 (2006.01); C03C 17/34 (2006.01); C03C 17/36 (2006.01); B05D 5/12 (2006.01); C23C 16/02 (2006.01); B05D 3/12 (2006.01); C03B 27/00 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1523 (2013.01); C03C 17/3417 (2013.01); C03C 17/3642 (2013.01); G02F 1/155 (2013.01); G02F 1/1533 (2013.01); B05D 3/12 (2013.01); B05D 5/12 (2013.01); C03B 27/00 (2013.01); C03C 2217/94 (2013.01); C03C 2218/31 (2013.01); C23C 16/0254 (2013.01); Y02P 40/57 (2015.11);
Abstract
Transparent conductive coatings are polished using particle slurries in combination with mechanical shearing force, such as a polishing pad. Substrates having transparent conductive coatings that are too rough and/or have too much haze, such that the substrate would not produce a suitable optical device, are polished using methods described herein. The substrate may be tempered prior to, or after, polishing. The polished substrates have low haze and sufficient smoothness to make high-quality optical devices.