The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Oct. 22, 2010
Applicants:

Hatice Altug, Watertown, MA (US);

Ahmet Ali Yanik, Brighton, MA (US);

Shyamsunder Erramilli, Quincy, MA (US);

Ronen Adato, Boston, MA (US);

Serap Aksu, Allston, MA (US);

Min Huang, Boston, MA (US);

Alp Artar, Brighton, MA (US);

Inventors:

Hatice Altug, Watertown, MA (US);

Ahmet Ali Yanik, Brighton, MA (US);

Shyamsunder Erramilli, Quincy, MA (US);

Ronen Adato, Boston, MA (US);

Serap Aksu, Allston, MA (US);

Min Huang, Boston, MA (US);

Alp Artar, Brighton, MA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/00 (2006.01); G01N 21/65 (2006.01); G01N 21/552 (2014.01); B82Y 20/00 (2011.01); B82Y 30/00 (2011.01); B82Y 15/00 (2011.01);
U.S. Cl.
CPC ...
G02B 5/008 (2013.01); G01N 21/554 (2013.01); G01N 21/658 (2013.01); B82Y 15/00 (2013.01); B82Y 20/00 (2013.01); B82Y 30/00 (2013.01); Y10S 977/932 (2013.01);
Abstract

The present invention generally relates to nanoantenna arrays and fabrication methods of said nanoantenna arrays. In particular, one aspect relates to nanoantenna arrays including nanostructures of predefined shapes in predefined patterns, which results in collective excitement of surface plasmons. The nanoantenna arrays can be used for spectroscopy and nanospectroscopy. Another aspects of the present invention relate to a method of high-throughput fabrication of nanoantenna arrays includes fabricating a reusable nanostencil for nanostensil lithography (NSL) which provides a mask to deposit materials onto virtually any support, such as flexible and thin-film stretchable supports. The nanostencil lithography methods enable high quality, high-throughput fabrication of nanostructures on conducting, non-conducting and magnetic supports. The nanostencil can be prepared by etching nanoapertures of predefined patterns into a waffer or ceramic membrane. In some embodiments, a nanoantenna array includes plasmonic nanostructures or non-plasmonic nanostructures.


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