The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Mar. 10, 2017
Applicant:

Veeco Instruments Inc., Plainview, NY (US);

Inventors:

Chi-Jung Cheng, Somerset, NJ (US);

Leo Chin, Poughquag, NY (US);

Christopher J. Morath, Basking Ridge, NJ (US);

Arindam Sinharoy, Furlong, PA (US);

Raymond C. Logue, Henderson, NV (US);

Assignee:

Veeco Instruments Inc., Plainview, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 29/024 (2006.01); G01N 29/44 (2006.01);
U.S. Cl.
CPC ...
G01N 29/024 (2013.01); G01N 29/4463 (2013.01); G01N 2291/011 (2013.01); G01N 2291/0212 (2013.01);
Abstract

A chemical vapor deposition or atomic layer deposition system includes a gas concentration sensor for determining the quantity of precursor gases admitted thereto. The gas concentration sensor can include a transmitter and a receiver for transmitting an acoustic signal across a chamber. In embodiments, the transmitter and receiver are designed to increase transmitted signal while reducing transmitted noise, facilitating use of the gas concentration sensor at low pressure and high temperature.


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