The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Mar. 10, 2016
Applicant:

Mitsubishi Electric Research Laboratories, Inc., Cambridge, MA (US);

Inventors:

Ulugbek Kamilov, Cambridge, MA (US);

Dehong Liu, Lexington, MA (US);

Hassan Mansour, Boston, MA (US);

Petros T. Boufounos, Arlington, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/02 (2006.01); G01N 22/00 (2006.01); G06N 3/08 (2006.01);
U.S. Cl.
CPC ...
G01N 22/00 (2013.01); G06N 3/084 (2013.01);
Abstract

A method propagates a pulse of wave through the material to receive a set of echoes resulted from scattering the pulse by different portions of the material and simulates a propagation of the pulse in the material using a neural network to determine a simulated set of echoes. Each node in a layer of the neural network corresponds to a portion of the material and assigned a value the permittivity of the portion of the material, such that the values of the nodes at locations of the portions form the image of the distribution of the permittivity of the material. The connection between two layers in the neural network models a scattering event. The method updates the values of the nodes by reducing an error between the received set of echoes and the simulated set of echoes to produce an image of the distribution of the permittivity of the material.


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