The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Jan. 05, 2018
Applicant:

Cnh Industrial America Llc, New Holland, PA (US);

Inventors:

Aaron Tollefsrud, Willmar, MN (US);

Richard Kerner, Sunbug, MN (US);

Assignee:

CNH Industrial America LLC, New Holland, PA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F01N 3/20 (2006.01); B01D 53/94 (2006.01);
U.S. Cl.
CPC ...
F01N 3/208 (2013.01); B01D 53/9418 (2013.01); B01D 53/9431 (2013.01); B01D 53/9495 (2013.01); B01D 2251/2067 (2013.01); B01D 2259/124 (2013.01); F01N 2610/02 (2013.01); F01N 2610/1473 (2013.01); F01N 2610/1493 (2013.01); F01N 2900/08 (2013.01); F01N 2900/1808 (2013.01);
Abstract

An exhaust after-treatment system has a DEF system with improved DEF purge cycling during which time DEF is returned to a DEF storage tank. The DEF system adapts its methodology based on a condition within the DEF system. A purge valve may be arranged in a doser feed line between a DEF supply module and a DEF doser module. A purging control system may be configured to control the purge valve based on detected states within the DEF system, such as a detected state that corresponds to a plugged DEF doser module. If a plugged doser module is detected, the purge valve may be opened to vent the doser module feed line to atmosphere which allows the DEF to be returned to the DEF storage tank without creating a siphon effect that could draw additional DEF from the DEF storage tank into the supply module.


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