The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2020
Filed:
Nov. 29, 2016
Basf SE, Ludwigshafen am Rhein, DE;
Falko Abels, Roemerberg, DE;
David Dominique Schweinfurth, Pfungstadt, DE;
Karl Matos, Sewickley, PA (US);
Daniel Loeffler, Birkenheide, DE;
Maraike Ahlf, Schriesheim, DE;
Florian Blasberg, Frankfurt, DE;
Thomas Schaub, Neustadt, DE;
Jan Spielmann, Mannheim, DE;
Axel Kirste, Limburgerhof, DE;
Boris Gaspar, Stuttgart, DE;
BASF SE, Ludwigshafen am Rhein, DE;
Abstract
The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.