The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Jul. 07, 2015
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Tomohiro Aburada, Painted Post, NY (US);

Jeffrey Robert Amadon, Lexington, KY (US);

Douglas Edward Brackley, Horseheads, NY (US);

Gautam Narendra Kudva, Horseheads, NY (US);

Gary Edward Merz, Rochester, NY (US);

Eric Lee Miller, Corning, NY (US);

Michael Yoshiya Nishimoto, Horseheads, NY (US);

Ian David Tracy, San Jose, CA (US);

Matthew Daniel Trosa, Horseheads, NY (US);

Rui Zhang, Elmira, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08B 17/06 (2006.01); C03B 33/00 (2006.01); B65H 20/32 (2006.01); C03B 17/06 (2006.01); C03B 33/023 (2006.01); C03B 33/09 (2006.01); B65H 23/188 (2006.01);
U.S. Cl.
CPC ...
C03B 17/068 (2013.01); B65H 20/32 (2013.01); B65H 23/1888 (2013.01); C03B 17/064 (2013.01); C03B 33/0235 (2013.01); C03B 33/091 (2013.01); B65H 2301/4148 (2013.01); B65H 2801/61 (2013.01);
Abstract

A method of continuously processing glass ribbon having a thickness ≤0.3 mm. The method includes providing a glass processing apparatus having a first processing zone, a second processing zone and a third processing zone. The glass ribbon is continuously fed from the first processing zone, through the second processing zone to the third processing zone. The feed rate of the glass ribbon is controlled through each processing zone using a global control device. A first buffer zone is provided between the first processing zone and the second processing zone in which the glass substrate is supported in a first catenary between two, spaced-apart, payoff positions. A second buffer zone is provided between the second processing zone and the third processing zone in which the glass substrate is supported in a second catenary between two, spaced-apart, payoff positions.


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