The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2020
Filed:
May. 23, 2014
Shincron Co., Ltd., Kanagawa, JP;
Shingo Samori, Kanagawa, JP;
Shinichi Takase, Kanagawa, JP;
Satoshi Sugawara, Kanagawa, JP;
Ekishu Nagae, Kanagawa, JP;
Yousong Jiang, Kanagawa, JP;
SHINCRON CO., LTD., Kanagawa, JP;
Abstract
A method for forming a thin film having durability at a low cost is provided. A film formation apparatusis used in the film formation method. The apparatuscomprises a vacuum containerin which a substrateis placed at a lower part, a vacuum pumpfor exhaust inside the container, a storage containerfor storing a coating agentprovided outside the container, and a nozzle having an ejection partcapable of ejecting the coating agentat its one end. A solution including two or more kinds of materials is used as the coating agent. The solution is ejected to the substrate in an atmosphere at a pressure set based on vapor pressures of respective materials composing the solution.