The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2020

Filed:

Feb. 17, 2018
Applicant:

Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v., Munich, DE;

Inventors:

Frank Wippermann, Meiningen, DE;

Andreas Brueckner, Jena, DE;

Andreas Braeuer, Schloeben, DE;

Alexander Oberdoerster, Jena, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/225 (2006.01); G02B 27/64 (2006.01); H04N 5/232 (2006.01);
U.S. Cl.
CPC ...
H04N 5/2259 (2013.01); G02B 27/646 (2013.01); H04N 5/2254 (2013.01); H04N 5/2258 (2013.01); H04N 5/2328 (2013.01); G03B 2205/0007 (2013.01);
Abstract

The fact that a beam-deflecting device can be produced cost-effectively and without any losses of optical quality of the multi-aperture imaging device is used when a carrier substrate is provided for the same, wherein the carrier substrate is common to the plurality of optical channels and is installed with a setting angle, i.e. oblique with respect to the image sensor in the multi-aperture imaging device such that a deflection angle of deflecting the optical path of each optical channel is based, on the one hand, on the setting angle and, on the other hand, on an individual inclination angle with respect to the carrier substrate of a reflecting facet of a surface of the beam-deflecting device facing the image sensor, the reflecting facet being allocated to the optical channel.


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