The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2020

Filed:

Aug. 22, 2016
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventors:

Tsuyoshi Oota, Ibo Hyogo, JP;

Yoichi Hori, Himeji Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/872 (2006.01); H01L 27/08 (2006.01); H01L 29/16 (2006.01); H01L 29/36 (2006.01); H01L 29/868 (2006.01);
U.S. Cl.
CPC ...
H01L 29/872 (2013.01); H01L 27/0814 (2013.01); H01L 29/0615 (2013.01); H01L 29/1608 (2013.01); H01L 29/36 (2013.01); H01L 29/868 (2013.01);
Abstract

A semiconductor device includes a semiconductor layer located between first and second electrodes. The contact location of the semiconductor layer with the first electrode forms a first contact plane. The semiconductor layer includes a first-conductivity-type first semiconductor region in contact with the first electrode, a second-conductivity-type second semiconductor region located between the first electrode and the first semiconductor region and contacting the first electrode, a second-conductivity-type third semiconductor region located between the first electrode and the second semiconductor region and contacting the first electrode and having a higher impurity concentration than that of the second semiconductor region, and a second-conductivity-type fourth semiconductor region located between the first electrode and the first semiconductor region and contacting the first electrode. The fourth semiconductor region is narrower than the second semiconductor region, shallower than the second semiconductor region, and has a lower impurity concentration than that of the third semiconductor region.


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