The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2020
Filed:
Jul. 21, 2017
Applicant:
Zeon Corporation, Chiyoda-ku, Tokyo, JP;
Inventors:
Takaaki Sakurai, Tokyo, JP;
Hirotoshi Inui, Tokyo, JP;
Assignee:
ZEON CORPORATION, Chiyoda-ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31116 (2013.01); H01L 21/3065 (2013.01);
Abstract
A plasma etching method for etching a multilayer laminate in which a silicon oxide film and a silicon nitride film are stacked includes an etching step of plasma etching the silicon oxide film and the silicon nitride film using a gas of a non-bromine-containing fluorocarbon together with a gas of a bromine-containing fluorocarbon compound represented by a compositional formula CHBrF.
Sakurai, Takaaki. (2020). Plasma etching method (U.S. Patent No. 10566208). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10566208
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile