The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2020
Filed:
Aug. 03, 2017
Google Inc., Mountain View, CA (US);
University of Maryland, College Park, College Park, MD (US);
David K. Fork, Mountain View, CA (US);
Jeremy N. Munday, North Bethesda, MD (US);
Tarun Narayan, Washington, DC (US);
Joseph B. Murray, Laurel, MD (US);
Google Inc., Mountain View, CA (US);
University of Maryland, College Park, College Park, MD (US);
Abstract
Enhanced Coulomb repulsion screening around light element nuclei is achieved by way of utilizing electromagnetic (EM) radiation to induce plasmon oscillations in target structures (e.g., nanoparticles) in a way that produces high density electron clouds in localized regions of the target structures, thereby generating charge density variations around light element atoms located in the localized regions. Each target structure includes an electrically conductive body including light elements (e.g., a metal hydride/deuteride/tritide) that is configured to undergo plasmon oscillations in response to the applied EM radiation. The induced oscillations causes free electrons to converge in the localized region, thereby producing transient high electron charge density levels that enhance Coulomb repulsion screening around light element (e.g., deuterium) atoms located in the localized regions. Various systems capable of implementing enhanced Coulomb repulsion screening are described, and various nanostructure compositions and configurations are disclosed that serve to further enhance fusion reaction rates.