The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2020
Filed:
Aug. 23, 2017
Applicants:
Tsinghua University, Beijing, CN;
Hon Hai Precision Industry Co., Ltd., New Taipei, TW;
Inventors:
Mo Chen, Beijing, CN;
Qun-Qing Li, Beijing, CN;
Li-Hui Zhang, Beijing, CN;
Yuan-Hao Jin, Beijing, CN;
Dong An, Beijing, CN;
Shou-Shan Fan, Beijing, CN;
Assignees:
Tsinghua University, Beijing, CN;
HON HAI PRECISION INDUSTRY CO., LTD., New Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/48 (2012.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 1/50 (2012.01);
U.S. Cl.
CPC ...
G03F 1/48 (2013.01); G03F 1/50 (2013.01); G03F 7/20 (2013.01); G03F 7/2047 (2013.01); G03F 7/30 (2013.01);
Abstract
A photolithography mask plate, the photolithography mask plate including: a substrate; a carbon nanotube layer on the substrate; a patterned chrome layer on the carbon nanotube layer, wherein the patterned chrome layer and the carbon nanotube layer have the same pattern; a cover layer on the patterned chrome layer.