The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2020

Filed:

Aug. 17, 2017
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Tatsuya Yoshihiro, Kanagawa, JP;

Tadashi Kasamatsu, Kanagawa, JP;

Shinichiro Sonoda, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/11 (2015.01); G02B 1/115 (2015.01); B32B 7/02 (2019.01); B32B 15/20 (2006.01); B32B 3/30 (2006.01); G02B 1/118 (2015.01);
U.S. Cl.
CPC ...
G02B 1/115 (2013.01); B32B 3/30 (2013.01); B32B 7/02 (2013.01); B32B 15/20 (2013.01); G02B 1/118 (2013.01);
Abstract

An antireflection film includes an uneven structure layer that has an uneven structure and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 8.5 μmor greater and has a film thickness of 200-250 nm, and the intermediate layer comprises a plurality of layers including at least a first layer, a second layer, a third layer, and a fourth layer.


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