The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2020
Filed:
Dec. 21, 2017
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); C08F 12/24 (2006.01); C09D 125/18 (2006.01); C08F 12/22 (2006.01); C08F 212/14 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
C08F 12/24 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/32 (2013.01); G03F 7/325 (2013.01); C08F 12/22 (2013.01); C08F 212/14 (2013.01); C09D 125/18 (2013.01); H01L 21/027 (2013.01);
Abstract
Provided is a pattern forming method including the successive steps of: a resist film forming step of forming a resist film using an actinic ray-sensitive or radiation-sensitive composition; an exposure step of exposing the resist film; a step of developing the exposed resist film using a developer, and a step of rinsing the developed resist film using a rinsing liquid containing an organic solvent. The developer includes a ketone-based or ether-based solvent having a branched alkyl group. The organic solvent contained in the rinsing liquid includes an ether-based solvent having a branched alkyl group.