The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2020
Filed:
Feb. 18, 2016
Si-ware Systems, Cairo, EG;
Mostafa Medhat, Heliopolis, EG;
Bassem Mortada, Cairo, EG;
Yasser Sabry, Cairo, EG;
Sebastian Nazeer, Les Ulis, FR;
Yasseen Nada, Heliopolis, EG;
Mohamed Sadek, Cairo, EG;
Bassam A. Saadany, Cairo, EG;
SI-WARE SYSTEMS, Cairo, EG;
Abstract
A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.