The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2020

Filed:

Aug. 30, 2016
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Jian Zhao, Kenmore, WA (US);

Michael Bleyer, Seattle, WA (US);

Raymond Kirk Price, Redmond, WA (US);

Denis Demandolx, Bellevue, WA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/80 (2017.01); G06K 9/00 (2006.01); G06K 9/32 (2006.01); G06T 7/00 (2017.01); H04N 13/128 (2018.01); G02B 27/01 (2006.01);
U.S. Cl.
CPC ...
H04N 13/128 (2018.05); G02B 27/0172 (2013.01); G02B 2027/014 (2013.01); G02B 2027/0138 (2013.01);
Abstract

Disclosed are an apparatus and a method for detecting deformation of a structured light depth imaging system and automatic re-calibration for the depth imaging system. In one embodiment, a depth imaging device includes a light projector, a camera and a processor. The light projector emits light corresponding to a projected pattern image having a plurality of features with known locations in the projected pattern image. The camera captures the light reflected by an environment of the depth imaging device and generates a reflected pattern image as a two-dimensional (2D) projection of the environment. The reflected pattern image includes a plurality of features that correspond to the features of the projected pattern image. The processor detects a misalignment for a distance or an orientation between the light projector and the camera based on a relationship between the features in the projected pattern image and the features in the reflected pattern image.


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