The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2020

Filed:

Apr. 11, 2018
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventors:

Koji Maekawa, Tokyo, JP;

Tatsuyoshi Mihara, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/82 (2006.01); H01L 29/66 (2006.01); H01L 21/8234 (2006.01); H01L 21/265 (2006.01); H01L 21/266 (2006.01); H01L 21/311 (2006.01); H01L 29/06 (2006.01); H01L 29/36 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823468 (2013.01); H01L 21/266 (2013.01); H01L 21/26513 (2013.01); H01L 21/31116 (2013.01); H01L 21/823418 (2013.01); H01L 21/823462 (2013.01); H01L 29/0615 (2013.01); H01L 29/36 (2013.01); H01L 29/6653 (2013.01); H01L 29/66477 (2013.01); H01L 29/66553 (2013.01); Y10S 257/90 (2013.01); Y10S 438/90 (2013.01);
Abstract

An insulating film and another insulating film are formed over a semiconductor substrate in that order to cover first, second, and third gate electrodes. The another insulating film is etched back to form sidewall spacers over side surfaces of the insulating film. Then, the sidewall spacers over the side surfaces of the insulating films corresponding to the sidewalls of the first and second gate electrodes are removed to leave the sidewall spacers over the side surfaces of the insulating film corresponding to the sidewalls of the third gate electrode. Then, the sidewall spacers and the insulating films are etched back, so that the sidewall spacers are formed of the insulating film over the sidewalls of the first, second, and third gate electrodes.


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