The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2020

Filed:

Feb. 27, 2018
Applicant:

Screen Holdings Co., Ltd., Kyoto-shi, Kyoto, JP;

Inventor:

Yoshio Ito, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); H01L 21/225 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/2253 (2013.01); H01L 21/68757 (2013.01);
Abstract

In a state where nothing is held on a quartz susceptor provided in a chamber, a lower chamber window made of quartz is heated to and maintained at a stable temperature by light irradiation from a continuous lighting lamp. Then, immediately before a semiconductor wafer to be treated is transferred into the chamber, an object to be heated that absorbs infrared light is held on the susceptor, and the object to be heated is heated by light irradiation from the continuous lighting lamp. The susceptor is preliminary heated to a stable temperature by the heated object to be heated. The lower chamber window and the susceptor are each heated to the stable temperature when a semiconductor wafer to be treated first is transferred into the chamber, so that temperature histories of all semiconductor wafers constituting one lot can be made uniform. This enables dummy running, before a semiconductor wafer to be treated first is transferred, to be eliminated.


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