The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2020
Filed:
Jul. 28, 2017
Electronics and Telecommunications Research Institute, Daejeon, KR;
Yong Ju Cho, Daejeon, KR;
Soon-heung Jung, Daejeon, KR;
Hyun Cheol Kim, Sejong-si, KR;
Jeongil Seo, Daejeon, KR;
Joo Myoung Seok, Daejeon, KR;
Sangwoo Ahn, Daejeon, KR;
Seung Jun Yang, Daejeon, KR;
Injae Lee, Daejeon, KR;
Hee Kyung Lee, Daejeon, KR;
Seong Yong Lim, Daejeon, KR;
Electronics and Telecommunications Research Institute, Daejeon, KR;
Abstract
Provided is a parallax minimization stitching method and apparatus using control points in an overlapping region. A parallax minimization stitching method may include defining a plurality of control points in an overlapping region of a first image and a second image received from a plurality of cameras, performing a first geometric correction by applying a homography to the control points, defining a plurality of patches based on the control points, and performing a second geometric correction by mapping the patches.