The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2020

Filed:

Nov. 27, 2012
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Karla K. Arndt, Rochester, MN (US);

James M. Caffrey, Woodstock, NY (US);

Keyur Patel, Poughkeepsie, NY (US);

Aspen L. Payton, Byron, MN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 11/30 (2006.01);
U.S. Cl.
CPC ...
G06F 11/3089 (2013.01);
Abstract

Techniques are described for monitoring a performance metric. A multiple modeling approach is used to improve predictive analysis by avoiding the issuance of warnings during spikes which occur as a part of normal system processing. This approach increases the accuracy of predictive analytics on a monitored computing system, does not require creating rules defining periodic processing cycles, reduces the amount of data required to perform predictive modeling, and reduces the amount of CPU required to perform predictive modeling.


Find Patent Forward Citations

Arndt, Karla. (2020). Multiple modeling paradigm for predictive analytics (U.S. Patent No. 10558545). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10558545

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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