The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2020
Filed:
Nov. 30, 2018
Olympus Corporation, Hachioji-shi, Tokyo, JP;
University of Tsukuba, Tsukuba-shi, Ibaraki, JP;
Yoshinori Iketaki, Tokyo, JP;
Hideaki Kanou, Tsukuba, JP;
OLYMPUS CORPORATION, Tokyo, JP;
UNIVERSITY OF TSUKUBA, Tsukuba-shi, JP;
Abstract
A super-resolution microscope includes an illuminator and a detector. The illuminator irradiates illumination beams of different wavelengths through an objective lens onto a sample while causing at least a portion of the illumination beams to overlap spatially and temporally. The detector detects a signal beam generated by the sample as a result of irradiation of the sample with the illumination beams. The illumination beams include a first illumination beam that induces a first nonlinear optical process with respect to the sample and a second illumination beam that induces a second nonlinear optical process that suppresses the first nonlinear optical process. The nonlinear susceptibility of the second nonlinear optical process is greater than the nonlinear susceptibility of the first nonlinear optical process.