The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2020

Filed:

Apr. 23, 2019
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Cheolmin Yun, Daejeon, KR;

Kyungjun Kim, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 290/06 (2006.01); C08G 73/10 (2006.01); C09D 179/08 (2006.01); C08J 5/18 (2006.01); C09D 151/08 (2006.01); C09D 7/20 (2018.01);
U.S. Cl.
CPC ...
C08F 290/065 (2013.01); C08G 73/101 (2013.01); C08G 73/1017 (2013.01); C08G 73/1032 (2013.01); C08G 73/1039 (2013.01); C08G 73/1053 (2013.01); C08G 73/1071 (2013.01); C08G 73/1078 (2013.01); C08J 5/18 (2013.01); C09D 7/20 (2018.01); C09D 151/08 (2013.01); C09D 179/08 (2013.01); C08J 2379/08 (2013.01);
Abstract

A modified polyimide represented by Formula 4: wherein D is a heat curable or photocurable functional group, R is a divalent or higher polyvalent organic group, and n is an integer of 1 or greater, X, X, X, and Xare each independently a tetravalent organic group derived from a tetracarboxylic dianhydride, Y, Y, and Yare each independently a divalent organic group derived from a diamine, p, q, r, and v are each independently an integer of 0 or greater, with the proviso that p, q, r, and v are not simultaneously 0, and r+v is 1 or greater. Additionally, curable resin compositions including the modified polyimide, as well as polyimide films including a cured product of the curable resin composition, and methods for preparing the modified polyimide.


Find Patent Forward Citations

Loading…