The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2020
Filed:
Jan. 30, 2018
Florida State University Research Foundation, Inc., Tallahassee, FL (US);
Bruce R. Locke, Tallahassee, FL (US);
Youneng Tang, Tallahassee, FL (US);
Robert Wandell, Tallahassee, FL (US);
FLORIDA STATE UNIVERSITY RESEARCH FOUNDATION, INC., Tallahassee, FL (US);
Abstract
A mixture comprising liquid water, a gas and at least one organic compound are injected into a non-thermal gas-liquid plasma discharge reactor to generate a flowing liquid film region with a gas stream flowing alongside. A plasma discharge is propagated along the flowing liquid film region. Water is dissociated and reactive species such as hydroxyl radicals, hydrogen peroxide and nitrogen oxides are formed. The organic compound reacts with the reactive species such as hydroxyl radicals and hydrogen peroxide present in the flowing liquid film region and in the flowing gas stream to produce organic compound dissociation products. At least some organic compound dissociation products and nitrogen oxides are transferred to a bioreactor for further degradation of organic compounds. The nitrogen oxides are used as nutrients for bacteria in the bioreactor. Feedback control of the plasma reactor is based on conditions detected and determined in the biological reactor.