The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2020

Filed:

Apr. 01, 2016
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Si Nae Lee, Daejeon, KR;

Sung Kyu Lee, Daejeon, KR;

Sang Beom Lee, Daejeon, KR;

Sung Ho Lee, Daejeon, KR;

Jeong Seok Kim, Daejeon, KR;

Joon Ho Shin, Daejeon, KR;

Dae Chul Jung, Daejeon, KR;

Yong Hee Jang, Daejeon, KR;

Tae Moon Park, Daejeon, KR;

Hyun Jik Yi, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 3/14 (2006.01); B01D 3/32 (2006.01); B01D 3/42 (2006.01); B01D 5/00 (2006.01); G03F 7/42 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
B01D 3/141 (2013.01); B01D 3/32 (2013.01); B01D 3/4261 (2013.01); B01D 5/0063 (2013.01); G03F 7/425 (2013.01); H01L 27/1288 (2013.01);
Abstract

By using the distillation device of the present application, energy loss occurring in a purification process of a solution including a waste stripper and a stripped photoresist resin used in a stripping process of a photoresist can be minimized and the installation cost of the distillation device can be reduced compared to the case in which dual distillation columns are used, thereby increasing the economic feasibility of a process.


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