The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
Jun. 18, 2013
Siemens Aktiengesellschaft, München, DE;
Matthias Schreiter, München, DE;
Wolfram Wersing, Bergen, DE;
Siemens Aktiengesellschaft, München, DE;
Abstract
The invention relates to a method for producing a polycrystalline ceramic film on a surface () of a substrate (), in which a particle stream is directed onto the surface () and the ceramic film is formed by deposition of the particles onto the surface (), wherein the particle stream is directed by means of a diaphragm onto the surface () along a preferred direction until a first specified layer thickness is reached, the preferred direction and a surface normal of the surface () enclosing a specified angle of incidence. According to the invention, the diaphragm is removed from the particle stream after the specified layer thickness has been reached, and additional particles are directed onto the surface () until a specified second layer thickness has been reached.