The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2020

Filed:

Jul. 05, 2017
Applicant:

Micromass Uk Limited, Wilmslow, GB;

Inventor:

John Brian Hoyes, Mellor, GB;

Assignee:

Micromass UK Limited, Wilmslow, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); H01J 49/06 (2006.01); H01J 49/40 (2006.01); H01J 49/42 (2006.01);
U.S. Cl.
CPC ...
H01J 49/062 (2013.01); H01J 49/40 (2013.01); H01J 49/421 (2013.01);
Abstract

An ion manipulation device is disclosed comprising: an ion receiving region () for receiving ions; a pair of electrodes () adjacent the ion receiving region (); and an AC or RF voltage supply () arranged to apply an AC or RF voltage to said electrodes (), or arranged and configured to generate an electromagnetic field that couples to said electrodes () in use, such that an electromagnetic standing wave () is generated between said electrodes (). A first of the electrodes () comprises one or more apertures through which an electric field from the standing wave () penetrates and enters the ion receiving region (), in use, for urging said ions away from the one or more apertures.


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